PGMEA
Essential component for advanced fine patterning,
Localization of eco-friendly, ultra-high purity PGMEA
Semiconductor circuits are becoming increasingly advanced, centering around Extreme Ultraviolet (EUV) Photolithography to
enable ultra-precise patterning at the nanometer scale.
As a result, there is a growing demand for higher purity and stability in process materials such as Photo Resists (PR) and thinners.
Chemtronics developed an eco-friendly ultra-high purity (99.999%) PGMEA, expanding our business in high-value added semiconductor components.
Chemtronics mass produces PGMEA (propylene glycol monomethyl ether acetate), a key solvent of Photo Resist used in EUV Photolithography processes, through in-house synthesis at an ultra-high purity level of 99.999% (5N).
We have achieved a global quality product by reducing metallic impurities and toxic isomer concentrations to below ppt (parts per trillion) and 1.5 ppt, respectively.
Key Uses of PGMEA
- 8 Key Processes of Semiconductor Manufacturing
Key Items
Chemtronics develops and mass produces PMGEA as well as other semiconductor materials.
