Silicon Wafer
150 mm ▪ 200 mm ▪ 300 mm
-
Removal of Wafer Film
Removal of film from the surface
of client’s silicon wafer -
Cleaning
Clean client’s silicon wafer,
SiC (silicon carbide), and
quartz components. -
Particle & Metal Count
Count particles and metallic
particles on customer’s wafer
surface with J3’s equipment
Particle (SP2),
Metal (ICP-MS) -
Dummy (Spacer) Wafer
Cleaned wafer after first
polishing process (CMP) -
Guarantee Wafer
Quality guaranteed product
processed to customer’s
specifications, with guaranteed
particle and metal
contamination levels
Key Products
-
- Guarantee Wafer
-
- Dummy (Spacer) Wafer
